North America Photoresist Process Chemicals Market Forecast to 2028 - COVID-19 Impact and Regional Analysis By Product Type, and Application

North America Photoresist Process Chemicals Market Forecast to 2028 - COVID-19 Impact and Regional Analysis By Product Type, and Application

  • July 2021 •
  • 92 pages •
  • Report ID: 6134751 •
  • Format: PDF
The North America photoresist process chemicals market is expected to grow from US$ 774.85 million in 2020 to US$ 1,123.67 million by 2028; it is estimated to grow at a CAGR of 4.8% from 2020 to 2028. Rising demand for these chemicals from various applications like semiconductors and ICs, LCDs, and printed circuit boards is propelling the photoresist chemicals market of the North American region. One of the major growth factors of the photoresist chemicals market in North America is their use in flat-panel displays. As these displays are thinner, lighter, and more energy-efficient, they are preferred over other displays, thereby stimulating the market growth in developed countries such as the US and Canada. Moreover, photoresists are further used in wiring configuration mainly in multi-layered semiconductor manufacturing, which further forms a key part of laptops, phones, servers, computers, music players, and household appliances. Increasing demand for these electronic products in the region has created an attractive market for photoresists chemicals. Therefore, technological advancements in display technology and growth in the semiconductor industry is projected to boost the demand for photoresist chemicals over the forecast period. Major market players present in the North America photoresist chemicals market, includes DisChem, Inc., DuPont de Nemours, Inc. among others. These players are constantly working towards the innovations in new product developments of photoresist chemicals with improved characteristics and qualities.

In North America, the US witnessed an unprecedented rise in number of COVID-19 cases, which led to the discontinuation of photoresist process chemicals manufacturing activities.Downfall of other chemical and materials manufacturing sectors has subsequently impacted the demand for photoresist process chemicals during the early months of 2020.

Moreover, decline in the overall semiconductor manufacturing activities has led to discontinuation of photoresist process chemicals manufacturing projects, thereby reducing the demand for photoresist process chemicals. Similar trend was witnessed in other North America countries, i.e., Mexico, Canada, Panama, and Costa Rica. However, the countries are likely to overcome thus drop in demand with the economic activities regaining their pace, especially in the beginning of the 2021.

Based on product type, the market is segmented into solvents, binders, sensitizer and others.The solvents segment led the North America photoresist process chemicals market in 2019.

A photoresist is also known as a resist, and it is a light-sensitive application utilized in several processes, such as photolithography & photoengraving, mainly to create a patterned coating on a surface.This process is known as crucial in the electronic industry.

The process starts by coating a substrate with a light-sensitive organic application.A patterned mask is further applied to the surface mainly to block light, so that only unmasked regions of the application can be exposed to light.

A solvent, known as a developer, is then employed to the surface. Solvents permits the photoresist to be applied by spin-coating. In terms of a positive photoresist, the photo-sensitive application is destroyed by light and the developer get dissolve away the regions that were exposed to light, by leaving behind a coating where the mask was placed. However, in terms of a negative photoresist, the photosensitive application is quite strengthened by light, and the developer get dissolve away only the regions that were not actually exposed to light, leaving behind a coating in the areas where the mask was not placed. Solvents are needed to create the photoresist a liquid, which further permits the resist to be spun onto a substrate. The solvents utilized in negative photoresists are non-polar organic solvents, including xylene, toluene, and halogenated aliphatic hydrocarbons. In positive resists, several organic solvents such as ethyl cellosolve acetate, diglyme, or cyclohexanone, and ethoxyethyl acetate can be used.

The overall North America photoresist process chemicals market size has been derived using both primary and secondary sources.To begin the research process, exhaustive secondary research has been conducted using internal and external sources to obtain qualitative and quantitative information related to the market.

The process also serves the purpose of obtaining an overview and forecast for the North America photoresist process chemicals market with respect to all the segments pertaining to the region.Also, multiple primary interviews have been conducted with industry participants and commentators to validate the data, as well as to gain more analytical insights into the topic.

The participants of this process include industry experts such as VPs, business development managers, market intelligence managers, and national sales managers, along with external consultants such as valuation experts, research analysts, and key opinion leaders, specializing in the North America photoresist process chemicals market. A few of the key companies operating in the market are Tokyo Ohka Kogyo Co., Ltd.; Tokuyama Corporation; Dupont; Integrated Micro Materials; Microchemicals Gmbh; Dischem Inc. and Sumitomo Chemical Co., Ltd.

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